Chapter 1 Characteristics of Thin Films
1．1 Definition of films
1．2 Surface effect
1．3 Thin film structures and defects
1．4 Basic requirements to make a thin film
Exercises

Chapter 2 Vacuum Technology Foundation
2．1 Basic concepts of vacuum
2．2 Dynamics of gas
2．3 Gas flow and gas extraction
2．4 Vacuum acquisition
2．5 Vacuum measurement
Exercises

Chapter 3 Plasma Technology Basis
3．1 Basic concepts of plasma
3．2 Classification of plasma
3．3 Occurrence of low-temperature plasma
Exercises

Chapter 4 Physical Vapor Deposition of Thin Films
4．1 Evaporation deposition
4．2 Sputtering deposition
4．3 Ion-beam deposition
4．4 Pulsed-laser deposition
4．5 Molecular-beam epitaxy
Exercises

Chapter 5 Chemical-vapor Deposition
5．1 Thermochemical-vapor deposition
5．2 Plasma-enhanced chemical-vapor deposition
5．3 High-density plasma chemical-vapor deposition
5．4 Other chemical-vapor deposition
Exercises

Chapter 6 Kinetics of the Process of Thin Film Growth
6．1 Four steps of thin film growth
6．2 Adsorption
6．3 Surface diffusion
6．4 Nucleation and growth of 2D islands
6．5 Crystallization and film growth
6．6 Growth modes
6．7 Structure development
6．8 Interfaces
Exercises

Chapter 7 Measurement of Film Thickness and Deposition Rate
7．1 Optical method
7．2 Balance method
7．3 Electrical method
7．4 Surface-roughness-meter method
Exercises

Chapter 8 Recent Advances of Thin Film Materials and Technology
8．1 Recent advances in thin film fabrication technologies
8．2 Some important electronic thin film materials
8．3 Progresses of two-dimensional thin film materials
Exercises

References